Nanocrystalline silicon ultrasonic emitter
ULSI technology using single crystal silicon (c-Si) as a substrate is essential for the development of today's industry. Furthermore, quantum sized silicon exhibits remarkable optical, electronic, thermal, and chemical properties. Working in conjunction with the Koshida laboratory at the Tokyo University of Agriculture and Technology, Yamatake has developed a nanocrystalline silicon (nc-Si) ultrasound emitter device based on a thermally induced effect. This device exhibits a flat frequency response over a wide range in contrast to the resonant behavior in conventional ultrasound generators. Possible arrayed integration using standard silicon processing is another important advantage. Making use of these features, we are working to develop such applications as ultrasonic speakers, high-precision sensors, and non-contact actuators. As mentioned above, nc-Si has enormous potential, and we plan to apply the nc-Si technology to the development of many products. |
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nc-Si ultrasound emitter |